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Introduction to Photolithography - WC, BLF, PA, Hard and Soft baking

By: HWC, Views: 6188

Prior to use, wafers are chemically cleaned to remove particulate matter on the surface as well as any traces of organic, ionic, and metallic impurities. Barrier Layer Formation After cleaning, the silicon wafer is covered with the material which will serve as a barrier layer. The most commo...

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